Design of line seeds for glancing angle deposition

This paper presents an enhanced seeding rule for the design and fabrication of line seeds glancing angle deposition (GLAD). GLAD is capable creating nanometer-level three-dimensional (3D) features by ballistic shadowing from natural/artificial nuclei at oblique incident angles in physical vapor processes. The features, including columns, springs, zigzags, ribbons, are building blocks a wide range optical, mechanical, sensing applications. Nanoribbons can be obtained sub-100 nm-wide GLAD; however, volume production ultralong fine lines difficult conventional techniques. Additionally, general process designing nanoribbons, especially with two-dimensional cross sections, lacking. fills gaps integrating design, fabrication, optimization obtaining nanoribbons GLAD. In this paper, new theory proposed first introducing empirical model accurately determining percent coverage over 70°. We discuss optimum shape size continuous solid ribbons matching under predetermined process. thickness controllable geometric parameters seeds; ?100 nm-thick micrometer-width created using photolithography. parabolic cross-sectional demonstrated as example applying upgraded rule. Finally, centimeter-long use templates nanochannels demonstrated.